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| - The etching gas may be a combination of hydrogen bromide or bromine with oxygen, nitrogen, hydrogen, a rare gas such as argon and helium, a Freon gas such as CF4, CBrF3, CHF3 and C2 ClF5, a halogen-bearing gas such as SF6, NF3, Cl2, BCl3, SiCl4 and CCl4.
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