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  • This can done by using the mechanical lapping and polishing system described above with a chemical such as silica or cerium oxide, to remove about 0.01???0.02 micrometers of quartz, followed up with a wet etch in ammonium bifluoride to remove about 0.005 micrometers of quartz from the quartz substrate 2, as shown in FIG. 5 e.
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