About: chemical vapor deposition cvd

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Attributes	Values
rdfs:label	chemical vapor deposition cvd
skos:broader	other method variety of technique conventional technique suitable process appropriate technique convenient method combination of method alternatively chemical process sputtering vapor deposition several method suitable deposition process conventional deposition technique deposition technique application art example means metal method process system use substrate various technique plasma suitable manner deposition method technique number of method number of technique known method apparatus deposition variety of method deposition process cnt various method know technique known manner variety of process cnts manufacturing process conventional means suitable means conventional method known technique other technique suitable method suitable technique angstrom use method known process other coating technique vacuum deposition conventional deposition process layer of silicon nitride number of conventional process substrate by technique variety of different technique convenient deposition method know deposition technique known deposition method known deposition process many different technique metallization technique molecular beam epitaxy mbe more deposition technique other deposition technique semiconductor fabrication process standard deposition technique suitable deposition technique vapor deposition technique vapor phase process various deposition technique
has head	cvd
has pre modifier	chemical vapor deposition
is skos:broader of	evaporation sputtering atomic layer deposition ald atmospheric pressure cvd apcvd metal method process oxidation like plasma ammonia reactor low pressure cvd chamber pressure chemical vapor deposition chemical vapor deposition lpcvd low pressure cvd lpcvd low-pressure cvd lpcvd plasma-enhanced cvd pecvd physical vapor deposition pvd

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